This patent is aimed at the technical defects of the hot and hot field of ALD polycrystalline ingot furnace in Germany. Through the improvement and development of the existing technology of polycrystalline ingot furnace, it has formed a new technology with independent intellectual property rights and developed a new product of polysilicon sheet. - Casting type monocrystalline silicon wafer. The process of casting a single crystal silicon wafer is different from that of single crystal silicon, but its performance is close to that of single crystal silicon. The company thus became the first company in the world to realize the commercial production of cast monocrystalline silicon wafers by casting.
According to reports, the patent solves the key technical problems of popular control and thermal field temperature gradient control of polycrystalline ingot furnace in photovoltaic industry, which can be used to produce low cost, high conversion efficiency (from 17.6% to 18.6%), low attenuation polysilicon. The film is a major technological innovation in the field of high-efficiency polycrystalline silicon wafer scale production, and has made great contributions to the development of solar cell products in the direction of environmental protection.
The patented invention and related products were awarded the title of National Strategic Innovation Product approved by the Ministry of Science and Technology in 2012, and won the third prize of the 2012 Zhejiang Science and Technology Award. It was also awarded the Provincial Excellent Industrial New Product by the Zhejiang Economic and Information Technology Commission. second prize.
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